Q (A. Romaniouk):
On Si-containing materials: Are there Si deposits on the wire or does Si
provoke DME polymerisation?
A (R. H.):
Unfortunately, we did not analyse the deposits for this aging
study. With the previous Ar/Ethane study we found Silicon present in all
deposits, probably because silicon compounds are present in dust
particles.
Remark (M. Titov):
There is a paper by Kadyk suggesting that when using a
CF4 / i-C4H10 (80:20)
mixture and non gold-plated wires, he observed polymer deposits, which were
orginally metal fluorides.
